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A simple model to analyze electron confinement and trapping in silicon nanodots

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

A procedure has been developed for analyzing charge confinement and trapping processes in silicon nanodots embedded in the oxide of a Metal-Oxide-Semiconductor structure. The electron levels and envelope functions in both the 2DEG in the silicon substrate and the 0DEG in the nanodot have been computed by self-consistently solving the Poisson and Schrödinger equations, including non-parabolicity corrections. The transfer probabilities between the two systems have been evaluated with the Bardeen formalism by adapting a procedure previously used in quantum-dot lasers.

Original languageEnglish
Title of host publication2005 Spanish Conference on Electron Devices, Proceedings
Pages345-348
Number of pages4
DOIs
StatePublished - 1 Dec 2005
Externally publishedYes
Event2005 Spanish Conference on Electron Devices - Tarragona, Spain
Duration: 2 Feb 20054 Feb 2005

Publication series

Name2005 Spanish Conference on Electron Devices, Proceedings
Volume2005

Conference

Conference2005 Spanish Conference on Electron Devices
Country/TerritorySpain
CityTarragona
Period2/02/054/02/05

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