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Characterization of oxygen related defects in silicon p-n junctions

  • J. A. Jiménez Tejada
  • , J. A. López Villanueva
  • , A. Godoy
  • , F. M. Gómez-Campos
  • , S. Rodríguez-Bolívar
  • , J. E. Carceller

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

One of the levels that is frequently detected in Czochralski-grown silicon (Cz-Si) by different authors is analyzed in a p-n+ junction at low and room temperatures for different bias conditions. We examine the results from different experimental techniques, usually employed to extract parameters in p-n junctions, to acquire a better understanding of the electrical activity of oxygen in Cz-Si, The reason of studying these results is because different electrical conditions during the characterization of identical samples can lead to contradictory conclusions. In order to link these disparate results we show how one of the oxygen related defects can act as a hole trap or as an electron trap at different temperatures.

Original languageEnglish
Title of host publication2005 Spanish Conference on Electron Devices, Proceedings
Pages37-40
Number of pages4
DOIs
StatePublished - 1 Dec 2005
Externally publishedYes
Event2005 Spanish Conference on Electron Devices - Tarragona, Spain
Duration: 2 Feb 20054 Feb 2005

Publication series

Name2005 Spanish Conference on Electron Devices, Proceedings
Volume2005

Conference

Conference2005 Spanish Conference on Electron Devices
Country/TerritorySpain
CityTarragona
Period2/02/054/02/05

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