Abstract
The role of the inversion-layer centroid in a double-gate metal-oxide-semiconductor field-effect-transistor (DGMOSFET) has been investigated. The expression obtained for the inversion charge is similar to that found in conventional MOSFET's, with the inversion-charge centroid playing an identical role. The quantitative value of this magnitude has been analyzed in volume-inversion transistors and compared with the value obtained in conventional MOSFETs. The minority-carrier distribution has been found to be even closer to the interfaces in volume-inversion transistors with very thin films, and therefore, some of the advantages assumed for these devices are ungrounded. Finally, the overall advantages and disadvantages of double-gate MOSFET's over their conventional counterparts are discussed.
| Original language | English |
|---|---|
| Pages (from-to) | 141-146 |
| Number of pages | 6 |
| Journal | IEEE Transactions on Electron Devices |
| Volume | 47 |
| Issue number | 1 |
| DOIs | |
| State | Published - 1 Jan 2000 |
| Externally published | Yes |
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