Skip to main navigation Skip to search Skip to main content

Monte Carlo study on electron transport properties in double-gate fully depleted SOI-MOSFETs

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

Abstract

The transport properties of very thin double gate SOI MOSFETs, have been studied. We have shown the importance of volume inversion, which greatly reduces the dependence of the electron mobility on the surface scattering mechanisms, and enhances the mobility at high inversion charge concentrations. We have also shown that if the silicon film is extremely thin, electron mobility abruptly decreases due to stronger phonon scattering.

Original languageEnglish
Title of host publicationEuropean Solid-State Device Research Conference
EditorsH. Grunbacher
PublisherIEEE Computer Society
Pages208-211
Number of pages4
ISBN (Electronic)2863322214
DOIs
StatePublished - 1 Jan 1997
Externally publishedYes
Event27th European Solid-State Device Research Conference, ESSDERC 1997 - Stuttgart, Germany
Duration: 22 Sep 199724 Sep 1997

Publication series

NameEuropean Solid-State Device Research Conference
ISSN (Print)1930-8876

Conference

Conference27th European Solid-State Device Research Conference, ESSDERC 1997
Country/TerritoryGermany
CityStuttgart
Period22/09/9724/09/97

Fingerprint

Dive into the research topics of 'Monte Carlo study on electron transport properties in double-gate fully depleted SOI-MOSFETs'. Together they form a unique fingerprint.

Cite this