Characterization of oxygen related defects in silicon p-n junctions

  • J. A. Jiménez Tejada
  • , J. A. López Villanueva
  • , A. Godoy
  • , F. M. Gómez-Campos
  • , S. Rodríguez-Bolívar
  • , J. E. Carceller

Producción científica: Capítulo del libro/informe/acta de congresoContribución a la conferenciarevisión exhaustiva

1 Cita (Scopus)

Resumen

One of the levels that is frequently detected in Czochralski-grown silicon (Cz-Si) by different authors is analyzed in a p-n+ junction at low and room temperatures for different bias conditions. We examine the results from different experimental techniques, usually employed to extract parameters in p-n junctions, to acquire a better understanding of the electrical activity of oxygen in Cz-Si, The reason of studying these results is because different electrical conditions during the characterization of identical samples can lead to contradictory conclusions. In order to link these disparate results we show how one of the oxygen related defects can act as a hole trap or as an electron trap at different temperatures.

Idioma originalInglés
Título de la publicación alojada2005 Spanish Conference on Electron Devices, Proceedings
Páginas37-40
Número de páginas4
DOI
EstadoPublicada - 1 dic. 2005
Publicado de forma externa
Evento2005 Spanish Conference on Electron Devices - Tarragona, Espana
Duración: 2 feb. 20054 feb. 2005

Serie de la publicación

Nombre2005 Spanish Conference on Electron Devices, Proceedings
Volumen2005

Conferencia

Conferencia2005 Spanish Conference on Electron Devices
País/TerritorioEspana
CiudadTarragona
Período2/02/054/02/05

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