Electron trapping and detrapping in near-interfacial traps during Fowler-Nordheim tunneling injection at 77 K

  • J. A. López-Villanueva
  • , J. E. Carceller
  • , F. Gámiz
  • , J. Banqueri

Producción científica: Contribución a una revistaArtículorevisión exhaustiva

4 Citas (Scopus)

Resumen

Results of injection experiments at 77 K, alternated with ascensions to room temperature are reported. Two trapping behaviours have been identified, with a relationship between them being noted. Both donor and acceptor interface traps have also been observed to be created. Results can be interpreted with a model based on oxide traps with energies above the silicon conduction band.

Idioma originalInglés
Páginas (desde-hasta)317-320
Número de páginas4
PublicaciónMicroelectronic Engineering
Volumen28
N.º1-4
DOI
EstadoPublicada - 1 ene. 1995
Publicado de forma externa

Huella

Profundice en los temas de investigación de 'Electron trapping and detrapping in near-interfacial traps during Fowler-Nordheim tunneling injection at 77 K'. En conjunto forman una huella única.

Citar esto