Resumen
A Monte Carlo simulator of the electron dynamics in the channel, coupled with a solution of the two-dimensional Poisson equation including inversion-layer quantization and drift-diffusion equations has been developed. This simulator has been applied to the study of electron transport in normal operation conditions for different submicron channel length devices. Some interesting non-local effects such as electron velocity overshoot can be observed.
| Idioma original | Inglés |
|---|---|
| Páginas (desde-hasta) | 287-290 |
| Número de páginas | 4 |
| Publicación | VLSI Design |
| Volumen | 6 |
| N.º | 1-4 |
| DOI | |
| Estado | Publicada - 1 ene. 1998 |
| Publicado de forma externa | Sí |
Huella
Profundice en los temas de investigación de 'Monte Carlo simulation of a submicron MOSFET including inversion layer quantization'. En conjunto forman una huella única.Citar esto
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